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JoVE Journal Bioengineering
Litografia de feixe de íons focada para etch nano-arquiteturas em microeletrodos
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Litografia de feixe de íons focada para etch nano-arquiteturas em microeletrodos

Article DOI: 10.3791/60004-v • 13:49 min • January 19th, 2020
January 19th, 2020 •
1, 2,4, 5, 6, 2,3,4
1Department of Electrical Engineering and Computer Science, University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine, University of Michigan, 4Department of Biomedical Engineering, University of Michigan, 5Michigan Center for Materials Characterization, University of Michigan, 6Carl Zeiss SMT, Inc.

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Mostramos que a gravura da nanoarquitetura em dispositivos de microeletrodo intracortical pode reduzir a resposta inflamatória e tem o potencial de melhorar as gravações eletrofisiológicas. Os métodos descritos aqui descrevem uma abordagem para gravar nano-arquiteturas na superfície de microeletrodos intracortical de silício de haste única não funcionais e funcionais.

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Bioengenharia Edição 155 litografia de feixe de íons focados microeletrodos intracortical nanoarquitetura eletrofisiologia neuroinflamação biocompatibilidade
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