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Selektiv Area Ændring af Silicon overfladebefugtelighed af Pulsed UV laser Bestråling i Liquid Miljø

Article DOI: 10.3791/52720-v • 08:48 min • November 9th, 2015
November 9th, 2015 •
1, 1, 1
1Laboratory for Quantum Semiconductors and Photon-based BioNanotechnology, Interdisciplinary Institute for Technological Innovation, Laboratoire Nanotechnologies Nanosystèmes (LN2)- CNRS UMI-3463, Faculty of Engineering, Université de Sherbrooke

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Vi rapporterer om en proces med in situ ændring af HF behandlet Si (001) overflade i en hydrofil eller hydrofob tilstand ved at bestråle prøver i mikrofluide kamre fyldt med H 2 O 2 / H 2 O opløsning (0,01% -0,5%) eller methanol-løsninger hjælp pulserende UV-laser af en slægtning lav puls indflydelse.

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Engineering Silicon overfladebefugtelighed laser-overflade interaktion selektiv område behandling excimerlaser røntgen fotoelektronspektroskopi trykvinkel
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