/
/
Blød Litografiske funktionalisering og mønster oxydfri silicium og germanium
This content is Free Access.
Chapters
- 00:05Title
- 03:25Forming a Primary Methyl-terminated Monolayer on Silicon
- 05:07Forming a Primary Methyl-terminated Monolayer on Germanium
- 05:50NHS Substrate
- 06:26Preparing and Using the Acidic Polyurethane Acrylate (PUA) Stamp
- 08:13Protein Pattern
- 09:21Catalytic Nano-patterning and Functionalization
- 11:02Conclusion
Her beskriver vi en simpel metode til at mønstret oxydfri silicium og germanium med reaktive organiske monolag og demonstrere funktionalisering af mønstrede substrater med små molekyler og proteiner. Den fremgangsmåde er helt beskytter overflader mod kemisk oxidation, giver præcis kontrol over funktionen morfologi, og giver let adgang til kemisk diskrimineret mønstre.
Tags
Soft Lithographic FunctionalizationPatterningOxide-free SiliconGermaniumHybrid Electronic Devices(bio)organic MaterialsInorganic SemiconductorsStable InterfaceElectron TransportOxidative DegradationSelf-assembled MonolayersAlkyl ChainsImpervious BarriersTraditional Patterning TechniquesImmobilizing Organic Molecular SystemsOptical FunctionElectronic FunctionMechanical FunctionChemical ActivityBiological ActivityMicrocontact PrintingNoble Metal SurfacesPattern TransferOxide-free Silicon And Germanium SubstratesInk DiffusionResolution Limit
