Shohei Ogura

Institute of Industrial Science

The University of Tokyo

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Количественное водорода концентрации в поверхностных и интерфейсных слоев и сыпучих материалов через профилирование по глубине с анализом ядерной реакции

1Institute of Industrial Science, The University of Tokyo, 2Micro Analysis Laboratory, Tandem accelerator, The University Museum, The University of Tokyo

JoVE 53452

 Engineering