Materials
| Name | Company | Catalog Number | Comments |
| High purity silicon wafers | Topsil | - | |
| 50 nm Si3N4/50 nm SiO2/Si wafers | Silicon Valley Microelectronics | - | |
| Sulfuric Acid 98% | BioLab | 19550523 | |
| Hydrogen Peroxide 30% | J.T. Baker | 2190-03 | |
| Ammonium Hydroxide 25% | J.T. Baker | 6051 | |
| Ethanol | J.T. Baker | 8025 | |
| Mesitylene | Sigma | M7200 | |
| Dichloromethane | Macron | 4881-06 | |
| Tetraethyl methylenediphosphonate | Aldrich | 359181 | |
| Mineral Oil | Sigma | M3516 | |
| Hydrofluoric Acid 49% | J.T. Baker | 9564-06 | |
| Isopropanol | J.T. Baker | 9079-05 | |
| N-Methyl-2-pyrrolidone | J.T. Baker | 9397-05 | |
| AZ nLOF2020 | AZ Electronic Materials | nLOF 2020 | |
| AZ 726 MIF | AZ Electronic Materials | 726 MIF | |
| Poly-L-Lysine solution | Sigma | P8920 | |
| Gold colloid solution | Ted Pella | 82160-80 | |
| RTA system | AnnealSys | MicroAS | |
| 4 point probe sheet resistance measurement system | Jandel | RM3-AR | |
| Mask aligner | Suss | MA06 | |
| e-Beam evaporator | VST | TFDS-141E | |
| Semiconductor analyzer | Agilent | B1500A | |
| CVD system | - | - | Home-built |
References
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- Koren, E., Rosenwaks, Y., Allen, J. E., Hemesath, E. R., Lauhon, L. J. Nonuniform. Doping distribution along silicon nanowires measured by kelvin probe force microscopy and scanning photocurrent microscopy. Appl. Phys. Lett. 95, 092105 (2009).
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