Metrology of micro and nano objects is of great importance for both industry and researchers. Indeed, miniaturization of objects represents a new challenge for optical metrology. Micro electro mechanical systems (MEMS) are generally defined has miniaturized electromechanical systems and usually comprises components such as micro sensors, micro actuators, microelectronics and microstructures. It has found many applications in diverse field such as biotechnology, medicine, communication and sensing1. Recently, the increasing complexity as well as the progressive miniaturization of test object features call for the development of suitable characterization techniques for MEMS. High throughput manufacturing of these complex microsystems requires the implementation of advanced inline measurement techniques, to quantify characteristic parameters and related defects caused by the process conditions2. For instance, the deviation of geometrical parameters in a MEMS device affects the system properties and has to be characterized. In addition, industry requires high resolution measurement performance, such as full three dimension (3D) metrology, large field of view, high imaging resolution, and real time analysis. Thus, it is essential to ensure a reliable quality control and inspection process. Moreover, it requires the measuring system to be easily implementable on a production line and thus relatively compact to be installed on existing infrastructures.
Holography, which was first introduced by Gabor3, is a technique that allows the recovery of the full quantitative information of an object by recording the interference between a reference and an object wave into a photosensitive medium. During this process known as recording, the amplitude, phase and polarization of a field are stored in the medium. Then the object wave field can be recovered by sending the reference beam onto the medium, a process known as optical reading of the hologram. Since a conventional detector only records the intensity of the wave, holography has been a subject of great interest in the past fifty years since it gives access to additional information on the electric field. However, several aspects of conventional holography make it unpractical for industry applications. Indeed, photosensitive materials are expensive and the recording process generally requires a high degree of stability. Advances in high resolution camera sensors such as charged coupled devices (CCD) have opened a new approach for digital metrology. One of those techniques is known as digital holography4. In Digital Holography (DH), the hologram is recorded on a camera (recording medium) and numerical processes are used to reconstruct the phase and intensity information. As with conventional holography, the result can be obtained after two main procedures: the recording and reconstruction as shown in Figure 1. However, if the recording is similar to conventional holography, the reconstruction is only numerical5. The numerical reconstruction process is shown in Figure 2. Two procedures are involved in the reconstruction process. Firstly, the object wave field is retrieved from the hologram. The hologram is multiplied with a numerical reference wave to get the object wavefront at the hologram plane. Secondly, the complex object wavefront is numerically propagated to the image plane. In our system, this step is performed using the convolution method6. The reconstructed field obtained is a complex function and thus phase and intensity can be extracted providing quantitative height information on the object of interest. The capability of whole field information storage in holography method and the use of computer technology for fast data processing offer more flexibility in experimental configuration and significantly increase the speed of the experimental process, opening up new possibilities to develop DH as a dynamic metrological tool for MEMS and micro-systems7,8.
Use of digital holography in phase contrast imaging is now well established and was first presented more than ten years ago9. Indeed, investigation of microscopic devices by combining digital holography and microscopy has been performed in many studies10, 11, 12, 13. Several systems based on high coherence14 and low coherence15 sources as well as different types of geometry13, 16, 17 (in line, off axis, common path…) have been presented. In addition, in line digital holography has been used previously in characterization of MEMS device18, 19. However, those systems are generally difficult to implement and bulky, making them unsuitable for industrial applications. In this study, we propose a compact, simple and lens free system based on off axis digital holography capable for real time MEMS inspection and characterization. The Compact Digital Holographic microscope (CDHM) is a lens less digital holographic system developed and patented to obtain the 3D morphology of micro-size specular objects. In our system, a 10 mW, highly stable, temperature controlled diode laser operating at 638 nm is coupled into a mono-mode fiber. As shown in Figure 3, the diverging beam emanating from the fiber is split into a reference and an object beam by a beam splitter. The reference beam path comprises a tilted mirror to realize the off axis geometry. The object beam is scattered and reflected by the sample. The two beams interfere on the CCD giving the hologram. The interference pattern imprinted onto the image is called a spatial carrier and permits the recovery of the quantitative phase information with only one image. The numerical reconstruction is performed using a common Fourier transform and convolution algorithm as stated previously. The lens-less configuration has several advantages making it attractive. As no lenses are used, the input beam is a diverging wave providing a natural geometrical magnification and thus improving the system resolution. Moreover, it is free of aberrations encountered in typical optical systems. As can be seen in Figure 3B, the system can be made compact (55x75x125 mm3), lightweight (400 g), and thus can be easily integrated into industrial production lines.