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Engineering

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Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
 

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Article doi: 10.3791/3725
July 2nd, 2012

Summary July 2nd, 2012

A micropunching lithography approach is developed to generate micro- and submicron-patterns on top, sidewall and bottom surfaces of polymer substrates. It overcomes the obstacles of patterning conducting polymers and generating sidewall patterns. This method allows rapid fabrication of multiple features and is free of aggressive chemistry.

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