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Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Article DOI: 10.3791/3725-v • 09:24 min • July 2nd, 2012
July 2nd, 2012 •
1, 1, 1
1Mechanical and Aerospace Engineering, University of Texas at Arlington

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Summary
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A micropunching lithography approach is developed to generate micro- and submicron-patterns on top, sidewall and bottom surfaces of polymer substrates. It overcomes the obstacles of patterning conducting polymers and generating sidewall patterns. This method allows rapid fabrication of multiple features and is free of aggressive chemistry.

Tags

Micropunching Lithography Generating Micro- And Submicron-patterns Polymer Substrates Conducting Polymers Lithographic Techniques Technical Challenges Photolithographic Methods Wet Etching Dry Etching Micro/nanosystems Planar Form Sidewall Patterns 3-D Circuits Fluidic Channels Horizontal Growth Of Nanowires And Nanotubes Macropunching Method
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