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JoVE Journal Bioengineering
Litografía de haz de iones enfocado a etch nano-arquitecturas en microelectrodos
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Litografía de haz de iones enfocado a etch nano-arquitecturas en microelectrodos

Article DOI: 10.3791/60004-v • 13:49 min • January 19th, 2020
January 19th, 2020 •
1, 2,4, 5, 6, 2,3,4
1Department of Electrical Engineering and Computer Science, University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine, University of Michigan, 4Department of Biomedical Engineering, University of Michigan, 5Michigan Center for Materials Characterization, University of Michigan, 6Carl Zeiss SMT, Inc.

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Hemos demostrado que el grabado de nanoarquitectura en dispositivos de microelectrodos intracorticales puede reducir la respuesta inflamatoria y tiene el potencial de mejorar las grabaciones electrofisiológicas. Los métodos descritos aquí describen un enfoque de nanoarquitecturas de etch en la superficie de microelectrodos intracorticales de silicio de vástago único no funcionales y funcionales.

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Bioingeniería Número 155 litografía de haz iónico focalizado microelectrodos intracorticales nanoarquitectura electrofisiología neuroinflamación biocompatibilidad
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