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聚焦 Ion 光束平版印刷到蚀刻纳米架构到微电极
JoVE Journal
Bioengineering
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JoVE Journal
Bioengineering
Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Please note that all translations are automatically generated.
Click here for the English version.
聚焦 Ion 光束平版印刷到蚀刻纳米架构到微电极
DOI:
10.3791/60004-v
•
13:49 min
•
January 19, 2020
•
Shreya Mahajan
,
Jonah A. Sharkins
4
,
Allen H. Hunter
,
Amir Avishai
,
Evon S. Ereifej
3,4
1
Department of Electrical Engineering and Computer Science
,
University of Michigan
,
2
Veteran Affairs Ann Arbor Healthcare System
,
3
Department of Neurology, School of Medicine
,
University of Michigan
,
4
Department of Biomedical Engineering
,
University of Michigan
,
5
Michigan Center for Materials Characterization
,
University of Michigan
,
6
Carl Zeiss SMT, Inc.
Chapters
00:04
Title
00:51
Aligning the Focus Ion Beam (FIB) to the Silicon Probes
09:46
Writing an Automated Process for Etching
11:28
Results: FIB Etched Nano-architecture on the Surfaces of Intracortical Probes and Microelectrodes Affects Neuron Density and Electrophysiology
13:08
Conclusion
Summary
Automatic Translation
English (Original)
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Automatic Translation
我们已经表明,将纳米结构蚀刻到皮内微电极装置中可以减少炎症反应,并有可能改善电生理记录。本文描述的方法概述了将纳米架构蚀刻到非功能和功能性单柄硅皮内微电极表面的方法。
Tags
Focused Ion Beam Lithography
FIB
Nano-architectures
Microelectrodes
Biocompatibility
Silicon
Metals
Polymers
Non-planar Surfaces
Post-processing
Scanning Electron Microscope
SEM
Silver Paint
Stage Coordinates
Nitrile Gloves
Navigation Camera
Microscope User Interface
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