Fabrication of Nanoheight Channels Incorporating Surface Acoustic Wave Actuation via Lithium Niobate for Acoustic Nanofluidics

Naiqing Zhang; James Friend

doi:10.3791/60648

Fabrication of Nanoheight Channels Incorporating Surface Acoustic Wave Actuation via Lithium Niob...

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Fabrication of Nanoheight Channels Incorporating Surface Acoustic Wave Actuation via Lithium Niobate for Acoustic Nanofluidics

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07:23 min

February 5, 2020

DOI: 10.3791/60648-v

Naiqing Zhang¹, James Friend¹

¹Medically Advanced Devices Laboratory, Center for Medical Devices, Department of Mechanical and Aerospace Engineering, Jacobs School of Engineering, and the Department of Surgery, School of Medicine,University of California San Diego

Overview

This article presents a detailed protocol for fabricating nano-height channels using surface acoustic wave actuation on lithium niobate for acoustic nanofluidics. The method includes room temperature plasma surface activated multilayer bonding, which is applicable for bonding lithium niobate to various oxides.

Key Study Components

Area of Science

Nanofluidics
Acoustic devices
Material fabrication

Background

Surface acoustic waves can manipulate fluids at the nanoscale.
Lithium niobate is a versatile material for acoustic applications.
Effective bonding techniques are crucial for device integrity.
Cleaning processes are essential to prevent bonding failures.

Purpose of Study

To develop a reliable method for creating nano-height channels.
To integrate surface acoustic wave actuation in nanofluidic devices.
To provide a visual demonstration of the fabrication process.

Methods Used

Fabrication of a mask using photolithography techniques.
Sputter deposition of chromium to create a sacrificial mask.
Plasma surface activation for multilayer bonding.
Cleaning protocols to remove debris and particulates.

Main Results

Successful fabrication of nano-height channels demonstrated.
Effective bonding of lithium niobate to oxides achieved.
Visual documentation of the entire fabrication process provided.
Protocol can be replicated by other researchers.

Conclusions

The described method is a significant advancement in nanofluidics.
Integration of acoustic actuation enhances device functionality.
Future applications may expand to other materials and configurations.

Frequently Asked Questions

What materials are used in the fabrication process?

The primary material used is lithium niobate, along with chromium for the sacrificial mask.

What is the significance of surface acoustic waves in this study?

Surface acoustic waves enable precise manipulation of fluids at the nanoscale, crucial for nanofluidic applications.

How does the cleaning process affect bonding?

Cleaning removes debris and particulates that could lead to bonding failures in the nano-height channels.

Can this method be applied to other materials?

Yes, the bonding process is also useful for bonding lithium niobate to silicon dioxide and other oxides.

Is there a visual demonstration available for this protocol?

Yes, a visual demonstration captures the entire fabrication process in detail.

We demonstrate fabrication of nanoheight channels with the integration of surface acoustic wave actuation devices upon lithium niobate for acoustic nanofluidics via liftoff photolithography, nano-depth reactive ion etching, and room-temperature plasma surface-activated multilayer bonding of single-crystal lithium niobate, a process similarly useful for bonding lithium niobate to oxides.

Our protocol provides a detailed fabrication method of nano-height channels incorporating surface acoustic wave actuation via lithium niobate for acoustic nanofluidics. This technique can be used to perform room temperature plasma surface activated multilayer bonding of single crystal lithium niobate, a process equally useful for bonding lithium niobate or silicon dioxide and other oxides. Any debris and particulates should be removed during the cleaning and plasma surface activated processes to prevent bonding failure in the nano-height channel formation.

Visual demonstration of this method can capture the entire fabrication process in detail resulting in a clear presentation of the protocol for other researchers. To prepare a nano-height channel mask, place a wafer inscribed with a pattern designed to be a normal photolithography in liftoff procedures into a sputter deposition system and draw down the chamber vacuum to five times 10 to the negative six millitorr. Allow argon to flow at 2.5 millitorr and sputter chromium at 200 watts to produce a 400 nanometer thick sacrificial mask within 18 minutes.

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