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Selektiv området Modifisering av Silicon Surface fuktbarhet av Pulsed UV Laser bestråling i flytende Miljø
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Selektiv området Modifisering av Silicon Surface fuktbarhet av Pulsed UV Laser bestråling i flytende Miljø

Article DOI: 10.3791/52720-v • 08:48 min • November 9th, 2015
November 9th, 2015 •
1, 1, 1
1Laboratory for Quantum Semiconductors and Photon-based BioNanotechnology, Interdisciplinary Institute for Technological Innovation, Laboratoire Nanotechnologies Nanosystèmes (LN2)- CNRS UMI-3463, Faculty of Engineering, Université de Sherbrooke

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Vi rapporterer om en fremgangsmåte for in situ endring av HF-behandlet Si (001) overflate i et hydrofile eller hydrofobe tilstand ved bestråling av prøvene i microfluidic kamre fylt med H 2 O 2 / H 2 O-løsning (0,01% -0,5%) eller metanol oppløsninger ved hjelp av pulserende UV laser av en relativ lav puls innflytelse.

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Engineering Silicon overflate fukting laser-overflate interaksjon selektiv område behandling excimer laser X-ray fotoelektron spektroskopi kontaktvinkel
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