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Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
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Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy

DOI:
10.3791/58113-v

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14:16 min

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October 23, 2018

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, , , , ,
1Department of Electrical and Computer Engineering,Virginia Commonwealth University

Chapters

  • 00:04Title
  • 01:01Growth and Preparation of GaN Template by Metal-Organic Chemical Vapor Deposition (MOCVD)
  • 04:42Molecular Beam Epitaxy (MBE) Growth of BeMgZnO/ZnO Heterostructures
  • 08:35Schottky Diode Fabrication
  • 10:09Results: Characterization of Zn-Polar Be0.02Mg0.26ZnO/ZnO Heterostructures and Ag/Be0.02Mg0.26ZnO/ZnO Schottky Diodes
  • 12:07Conclusion

Summary

Automatic Translation

Automatic Translation

Attainment of high-quality Schottky contacts is imperative for achieving efficient gate modulation in heterostructure field effect transistors (HFETs). We present the fabrication methodology and characteristics of Schottky diodes on Zn-polar BeMgZnO/ZnO heterostructures with high-density two dimensional electron gas (2DEG), grown by plasma-assisted molecular beam epitaxy on GaN templates.

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Keywords: Schottky DiodesZn-polar BeMgZnO/ZnO HeterostructurePlasma-assisted Molecular Beam EpitaxyZinc OxideHeterojunction Field Effect TransistorsTwo-dimensional Electron GasHigh-frequencyHigh-power Field Effect TransistorsElectron SaturationSchottky Contact StabilitySolar Plant DetectorsChemical SensorsBiosensorsSapphire SubstrateMetal Organic CVDAluminum NitrideGallium Nitride

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