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活性溅射沉积的氧化氮薄膜：氧气流速效应
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JoVE Journal Chemistry
Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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活性溅射沉积的氧化氮薄膜：氧气流速效应

DOI:
10.3791/59929-v

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08:23 min

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September 28, 2019

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, , , , ,
1Chemistry Department,Federal University of São Carlos (UFSCAR), 2Physics Department, School of Sciences,São Paulo State University (UNESP)

Chapters

  • 00:04Title
  • 00:47Niobium Oxide Film Deposition
  • 03:55Solar Cell Construction
  • 05:46Results: The Effects of Oxygen Flow Rates on Reactive Sputtering
  • 07:23Conclusion

Summary

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Automatic Translation

在这里，我们提出了一个协议，通过反应溅射以不同的氧气流速沉积氧化氮薄膜，作为在perovskite太阳能电池中的电子传输层。

Tags

Reactive SputteringNiobium Oxide FilmsOxygen Flow RateThin Film DepositionSubstrate PreparationSputtering Process ParametersFilm ThicknessPlasma CleaningImpedance Matching

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