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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
JoVE Journal
Chemistry
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JoVE Journal Chemistry
Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
DOI:

08:23 min

September 28, 2019

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Chapters

  • 00:04Title
  • 00:47Niobium Oxide Film Deposition
  • 03:55Solar Cell Construction
  • 05:46Results: The Effects of Oxygen Flow Rates on Reactive Sputtering
  • 07:23Conclusion

Summary

Automatic Translation

Here, we present a protocol for niobium oxide films deposition by reactive sputtering with different oxygen flow rates for use as an electron transport layer in perovskite solar cells.

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