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光增强氢氟酸钝化:一个敏感的技术检测散装硅缺陷
JoVE Journal
Engineering
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JoVE Journal
Engineering
Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects
Please note that all translations are automatically generated.
Click here for the English version.
光增强氢氟酸钝化:一个敏感的技术检测散装硅缺陷
DOI:
10.3791/53614-v
•
09:15 min
•
January 04, 2016
•
Nicholas E. Grant
1
Research School of Engineering
,
Australian National University
Chapters
00:05
Title
01:02
Cleaning and Etching the Silicon Wafers
04:08
Silicon Wafer Passivation and Photoconductive (PC) Measurement
07:08
Results: Silicon Wafer Photoconductive Measurement after Surface Passivation
08:10
Conclusion
Summary
Automatic Translation
English (Original)
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Automatic Translation
一个RT液体表面钝化技术研究体硅缺陷的重组活性描述。对于该技术是成功的,三个关键的步骤是必需的:(ⅰ)化学清洗和硅的蚀刻,硅的(ⅱ)浸没在15%的氢氟酸和(iii)照明1分钟。
Tags
Silicon Wafers
Bulk Defects
Surface Passivation
Hydrofluoric Acid
Chemical Cleaning
SC1
SC2
Recombination Activity
High-purity Silicon
Solar Cells
Lifetime
DI Water
Quartz Cradle
Fume Hood
Temperature Control
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