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Single-molecule techniques such as single molecule fluorescence resonance energy transfer (smFRET) or single molecule fluorescence correlation spectroscopy (FCS) are powerful tools for molecular biophysics, allowing the study of dynamic movements, conformations, and interactions of individual biomolecules in processes such as transcription1,2,3, translation4,5,6, and many others7. For smFRET, total internal reflection fluorescence (TIRF) microscopy is a common method because many tethered molecules may be followed over time, and the evanescent wave generated by TIR is limited to a 100−200 nm region adjacent to the coverslip8. However, even with this restriction on excitation volume, fluorophores of interest still need to be diluted to pM or nM ranges in order to detect single molecule signals above background fluorecence9. Since the Michaelis-Menten constants of cellular enzymes are typically in the μM to mM range10, biochemical reactions in single molecule studies are usually much slower than those in the cell. For example, protein synthesis occurs at 15−20 amino acids per second in E. coli11,12, while most prokaryotic ribosomes in smFRET experiments translate at 0.1−1 amino acid per second13. In protein synthesis, crystal structures and smFRET on stalled ribosomes showed that transfer RNAs (tRNAs) fluctuate between ‘hybrid’ and ‘classical’ states before the tRNA-mRNA translocation step14,15. However, when physiological concentrations of the translocation GTPase factor, EF-G, was present, a different conformation, intermediate between the hybrid and classical states, was observed in smFRET6. Studying dynamic molecular processes at rates and concentrations similar to those in the cell is important, but remains a technical challenge.
A strategy to increase the fluorescent substrate concentration is the use of metal-based, sub-visible wavelength apertures, called zero mode waveguides (ZMWs), to generate confined excitation fields that selectively excite biomolecules localized within the apertures16 (Figure 1). The apertures are typically 100−200 nm in diameter and 100−150 nm in depth17. Above a cutoff wavelength related to the size and shape of the wells (λc ≈ 2.3 times the diameter for circular waveguides with water as the dielectric medium18), no propagating modes are allowed in the waveguide, hence the term zero mode waveguides. However, an oscillating electromagnetic field, termed an evanescent wave, exponentially decaying in intensity still tunnels a short distance into the waveguide18,19. Although similar to TIR evanescent waves, ZMW evanescent waves have a shorter decay constant, resulting in 10−30 nm effective excitation region within the waveguide. At micromolar concentrations of fluorescently labeled ligands, only one or a few molecules are simultaneously present within the excitation region. This restriction of the excitation volume and consequent reduction of background fluorescence enables fluorescence imaging of single molecules at biologically relevant concentrations. This has been applied to many systems20, including FCS measurements of single protein diffusion21, single molecule FRET measurements of low-affinity ligand-protein22 and protein-protein interactions23, and spectro-electrochemical measurements of single molecular turnover events24.
ZMWs have been produced by directly patterning a metal layer using ion beam milling25,26 or electron beam lithography (EBL) followed by plasma-etching16,27. These maskless lithography methods create waveguides in series and typically require access to specialized nanofabrication facilities, preventing widespread adoption of ZMW technology. Another method, ultraviolet nanoimprint lithography lift-off28, uses a quartz slide mold to press an inverse ZMW template onto a resist film like a stamp. While this method is more streamlined, it still requires EBL for fabrication of the quartz mold. This article presents the protocol for a simple and inexpensive templated fabrication method that does not require EBL or ion-beam milling and is based on close-packing of nanospheres to form a lithographic mask.
Nanosphere or “natural” lithography, which was first proposed in 1982 by Deckman and Dunsmuir29,30, uses the self-assembly of monodisperse colloidal particles, ranging from tens of nanometers to tens of micrometers31, to create templates for surface patterning via etching and/or deposition of materials. The two-dimensional (2D) or three-dimensional (3D) extended periodic arrays of colloidal particles, referred to as colloidal crystals, are characterized by a bright iridescence from scattering and diffraction32. Although less widely used than electron-beam or photolithography, this masking methodology is simple, low cost, and easily scaled down to create feature sizes below 100 nm.
Directing the self-assembly of colloidal particles determines the success of using colloidal crystals as masks for surface patterning. If the size and shape of particles are homogeneous, colloidal particles can be readily self-assembled with hexagonal packing, driven by entropic depletion33. Water evaporation after drop-coating is an effective route to sediment the colloidal particles, although other methods include dip-coating34, spin coating35, electrophoretic deposition36, and consolidation at an air-water interface37. The protocol presented below is based on the evaporation sedimentation method, which was the simplest to implement. The triangular interstices between close-packed polystyrene beads form openings in which to plate a sacrificial metal, forming posts (Figure 2 and Supplemental Figure 1). Brief annealing of the beads before this step adjusts the shape and diameter of these posts. The beads are removed, a final metal layer is deposited around the posts, and then the posts are removed. After the two metal deposition steps onto the colloidal nanomask, removal of the intermediate posts, and surface chemistry modification for passivation and tethering, ZMW arrays are ready to use for single molecule imaging. More extensive characterization of the ZMW optical properties after fabrication can found in an accompanying article38. Besides a thermal evaporator for vapor deposition of the metals, no specialized tools are required.