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Selektiv Area Ændring af Silicon overfladebefugtelighed af Pulsed UV laser Bestråling i Liquid Miljø
JoVE Journal
Engineering
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JoVE Journal Engineering
Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
DOI:

08:48 min

November 09, 2015

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Chapters

  • 00:05Title
  • 01:24Sample Preparation
  • 02:16Pulsed UV Laser Irradiation in Liquid Environment
  • 03:18Immobilization of Bio-conjugated Nanospheres
  • 03:56Contact Angle Measurement
  • 05:05XPS Measurement
  • 05:52Results: Pulsed UV Laser Irradiation Increases SiOH Surface Concentration
  • 07:10Conclusion

Summary

Automatic Translation

Vi rapporterer om en proces med in situ ændring af HF behandlet Si (001) overflade i en hydrofil eller hydrofob tilstand ved at bestråle prøver i mikrofluide kamre fyldt med H 2 O 2 / H 2 O opløsning (0,01% -0,5%) eller methanol-løsninger hjælp pulserende UV-laser af en slægtning lav puls indflydelse.

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