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Epitaxial Nanostructured α-Quartz Films på silisium
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Epitaxial Nanostructured α-Quartz Films på silisium: Fra materialet til nye enheter

Article DOI: 10.3791/61766-v • 11:34 min • October 6th, 2020
October 6th, 2020 •
1, 1, 1, 1, 1
1Institut d'Electronique et des Systemes (IES), CNRS, Université de Montpellier

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Dette arbeidet presenterer en detaljert protokoll for mikrofabrikasjon av nanostrukturert α-kvarts cantilever på en Silicon-On-Isolator (SOI) teknologi substrat starter fra epitaxial vekst av kvartsfilm med dip belegg metode og deretter nanostructuration av tynnfilm via nanoimprint litografi.

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Engineering nanoimprint litografi (NIL) nanostrukturert α-kvarts SOI substrat piezoelektrisk mikrofabrikasjon litografi etsning cantilever MEMS
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