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Bioengineering
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基于多步法链位移光刻的基因功能表面固定化研究
JoVE Journal
Bioengineering
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JoVE Journal
Bioengineering
Functional Surface-immobilization of Genes Using Multistep Strand Displacement Lithography
Please note that all translations are automatically generated.
Click here for the English version.
基于多步法链位移光刻的基因功能表面固定化研究
DOI:
10.3791/58634-v
•
11:05 min
•
October 25, 2018
•
Günther Pardatscher*
1
,
Matthaeus Schwarz-Schilling*
1
,
Sandra Sagredo
,
Friedrich C. Simmel
1
Physics Department
,
Technical University of Munich
Chapters
00:04
Title
00:57
Chip Fabrication
02:43
Substrate Preparation for Photolithography
04:11
Projection Lithography
05:40
Holder Assembly for Compartmentalized Gene Expression
07:17
Setup for Gene Expression Analysis
09:23
Results: Bephore Lithography and Compartmentalized Gene Expression
10:29
Conclusion
Summary
Automatic Translation
English (Original)
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Automatic Translation
我们描述了一种简单的光刻程序, 用于固定在表面上的基因长度 DNA 分子, 可用于在生物芯片上执行无细胞基因表达实验。
Tags
DNA Biochips
Self Re-synthetic Biology
Bephore Lithography
DNA Strand Displacement
Multistep Lithography
PEGylation
Biotin-PEG-Silane
Silicon Wafer Cleaning
Substrate Preparation
Gene Immobilization
Functional Gene Brushes
Protein Expression
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