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Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
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JoVE Journal Engineering
Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon

DOI:
10.3791/58897-v

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06:57 min

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July 17, 2020

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, , ,
1Department of Materials Engineering,The University of Tokyo, 2Department of Electrical and Electronic Information Engineering,Toyohashi University of Technology, 3Department of Materials Science and Engineering,Massachusetts Institute of Technology

Chapters

  • 00:04Introduction
  • 00:34Experimental Verification Procedure
  • 04:29Results: Reduction of Threading Dislocation Density in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
  • 06:12Conclusion

Summary

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Automatic Translation

Theoretical calculation and experimental verification are proposed for a reduction of threading dislocation (TD) density in germanium epitaxial layers with semicylindrical voids on silicon. Calculations based on the interaction of TDs and surface via image force, TD measurements, and transmission electron microscope observations of TDs are presented.

Tags

Keywords: Dislocation ReductionGermanium Epitaxial LayersSemicylindrical VoidsSiliconThreading Dislocation DensitySelective Epitaxial GrowthBoron-doped P-siliconSilicon DioxidePhotoresistBuffered Hydrofluoric AcidGermanium Growth

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