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Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates
JoVE Journal
Bioengineering
This content is Free Access.
JoVE Journal Bioengineering
Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates
DOI:

07:19 min

March 07, 2014

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Chapters

  • 00:05Title
  • 01:17Fabrication of Parylene Patterns on SiO2
  • 03:31Chip Cleaning and Activation
  • 04:26Plating Cell Line On-chip
  • 05:12Results: Cell Patterning on Photolithographically-defined Parylene-C
  • 06:49Conclusion

Summary

Automatic Translation

This protocol describes a microfabrication-compatible method for cell patterning on SiO2. A predefined parylene-C design is photolithographically printed on SiO2 wafers. Following incubation with serum (or other activation solution) cells adhere specifically to (and grow according to the conformity of) underlying parylene-C, whilst being repulsed by SiO2 regions.

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