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Nanoimpresión electroquímica asistida por metal de obleas de silicio poroso y sólido
JoVE Journal
Engineering
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JoVE Journal Engineering
Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
DOI:

09:18 min

February 08, 2022

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Chapters

  • 00:05Introduction
  • 01:19Mac-imprint Stamp Preparation
  • 02:43Photoresist Ultraviolet (UV) Nanoimprinting
  • 04:05Gold and Silver/Gold Catalyst Thin Film Deposition
  • 05:17Silver/Gold Catalyst Thin Film Dealloying
  • 06:01Mac-imprint Operation
  • 07:33Results: Representative Au Porous Stamp and Si Mac-imprint Imaging
  • 08:31Conclusion

Summary

Automatic Translation

Se presenta un protocolo para la impresión química asistida por metal de características de microescala 3D con una precisión de forma inferior a 20 nm en obleas de silicio sólido y poroso.

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